Performance Evaluation of a Low Energy Universal Gate for VLSI with 16nm Technology. NTU Journal of Engineering and Technology, [S. l.], v. 1, n. 3, 2022. DOI: 10.56286/ntujet.v1i3.209. Disponível em: https://journals.ntu.edu.iq/index.php/NTU-JET/article/view/209.. Acesso em: 9 apr. 2025.